Inverse mask design and correction for electronic design

作者: Yuri Granik , Kyohei Sakajiri

DOI:

关键词:

摘要: Various implementations of the invention provide for generation “smooth” mask contours by inverse transmission derivation and subsequently “smoothing” derived proximity correction.

参考文章(26)
Srinivas Bollepalli, Yan Borodovsky, Kenny Toh, Bin Hu, Bikram Baidya, Vivek Singh, Determining an optimizaton for generating a pixelated photolithography mask with high resolution imaging capability ,(2005)
H. Gamo, III Matrix Treatment of Partial Coherence Progress in Optics. ,vol. 3, pp. 187- 332 ,(1964) , 10.1016/S0079-6638(08)70571-7
Panos M. Pardalos, Yinyu Ye, Chi-Geun Han, ON THE SOLUTION OF INDEFINITE QUADRATIC PROBLEMS USING AN INTERIOR-POINT ALGORITHM Informatica (lithuanian Academy of Sciences). ,vol. 3, pp. 474- 496 ,(1992) , 10.3233/INF-1992-3403
Amyn Poonawala, Peyman Milanfar, Prewarping techniques in imaging: applications in nanotechnology and biotechnology electronic imaging. ,vol. 5674, pp. 114- 127 ,(2005) , 10.1117/12.597694
D. C. Sorensen, Newton's method with a model trust region modification SIAM Journal on Numerical Analysis. ,vol. 19, pp. 409- 426 ,(1982) , 10.1137/0719026
Sung-Hoon Jang, Sonny Y. Zinn, Won-Tai Ki, Ji-Hyun Choi, Chan-Uk Jeon, Seong-Woon Choi, Hee-Sun Yoon, Jung-Min Sohn, Yong-Ho Oh, Jai-Cheol Lee, Sungwoo Lim, Manufacturability evaluation of model-based OPC masks 22nd Annual BACUS Symposium on Photomask Technology. ,vol. 4889, pp. 520- 529 ,(2002) , 10.1117/12.468093
Chi-Yuan Hung, Qingwei Liu, Kyohei Sakajiri, Shumay D. Shang, Yuri Granik, Model based insertion of assist features using pixel inversion method: implementation in 65nm node Proceedings of SPIE, the International Society for Optical Engineering. ,vol. 6283, ,(2006) , 10.1117/12.681816
Yong Liu, Avideh Zakhor, Binary and phase-shifting image design for optical lithography Optical/Laser Microlithography IV. ,vol. 1463, pp. 382- 399 ,(1991) , 10.1117/12.44797
Robert J. Socha, Douglas J. Van Den Broeke, Stephen D. Hsu, J. Fung Chen, Thomas L. Laidig, Noel P. Corcoran, Uwe Hollerbach, Kurt E. Wampler, Xuelong Shi, Willard E. Conley, Contact hole reticle optimization by using interference mapping lithography (IML) Photomask and Next-Generation Lithography Mask Technology XI. ,vol. 5446, pp. 516- 534 ,(2004) , 10.1117/12.557747