Integration of Optical Proximity Correction and Mask Data Preparation
作者： Emile Y Sahouria
DOI:
关键词:
摘要: Aspects of the invention relate to techniques for integrating optical proximity correction and mask data preparation. First writer instructions a layout design are simulated generate contour. Based on generated contour, first adjusted second data. Using as target, instructions. The above process may be iterated until an end condition is met.
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