Thermal post-deposition treatment effects on nanocrystalline hydrogenated silicon prepared by PECVD under different hydrogen flow rates
作者： Sana Ben Amor , Hosny Meddeb , Ridha Daik , Afef Ben Othman , Sonia Ben Slama
DOI: 10.1016/J.APSUSC.2015.10.207
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摘要: In this paper, hydrogenated nanocrystalline silicon (nc-Si:H) thin films were deposited on mono-crystalline silicon substrate by plasma enhanced chemical vapor deposition (PECVD) …
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