Chemistry in long residence time fluorocarbon plasmas

摘要: The densities of radicals and neutrals in fluorocarbon (FC) plasmas have been investigated an inductively coupled plasma system to understand the predominant gain loss mechanisms dissociative products their interaction with chamber surfaces. input parameters varied this experiment are source chuck gap F: C ratio feed gas. F, CF2, CF3, CF4, C2F4, SiF4, COF2, CO, CO2 measured analyzed. In addition, two different forms C4F8, standard cyclic c a radical linear l structures observed C4F8 containing plasmas. l-C4F8 is shown be primary dissociation product c-C4F8 and, thus, cannot neglected from calculations rate electron collisions. This implies that typically cited (primarily C2F4) can dual production channels: one other directly c-C4F8. Furthermore, density CF4 shows strong correlation F ...