Surface phenomena involved in the formation of Co nanoparticles on amorphous carbon and SiO2 deposited by magnetron sputtering
作者： Stéphane Lucas , Jean-François Colomer , Carla Bittencourt , Pavel Moskovkin , Nicolas Moreau
DOI: 10.1007/S00339-010-5566-7
关键词:
摘要: High-pressure DC magnetron sputtering was used for the deposition of cobalt on amorphous carbon (a-C) and SiO2. Deposition conditions, substrate surface morphology annealing parameters are investigated in order to promote synthesis large arrays nanoparticles, with regular size shape. Uniformly distributed Co nanoparticles a few nanometers were formed under at 700°C H2. Particle nucleation growth discussed based X-ray photoelectron spectroscopy, transmission scanning electron microscopy kinetic Monte Carlo modeling (KMC).
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