Stress Control in 3C-SiC Films Grown on Si(111)

作者: Petia Weih , Oliver Ambacher , Jörg Pezoldt , Charbel Zgheib , Pierre M. Masri

DOI: 10.4028/WWW.SCIENTIFIC.NET/MSF.457-460.301

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参考文章(10)
Petia Weih, Volker Cimalla, Christian Förster, Jörg Pezoldt, Thomas Stauden, Lothar Spieß, Henry Romanus, M. Eickhoff, M. Hermann, Pierre M. Masri, Oliver Ambacher, High-Resolution XRD Investigations of the Strain Reduction in 3C-SiC Thin Films Grown on Si (111) Substrates Materials Science Forum. pp. 233- 236 ,(2003) , 10.4028/WWW.SCIENTIFIC.NET/MSF.433-436.233
J. Pezoldt, Ch. Förster, P. Weih, P. Masri, Electrical characterization of SiC/Si heterostructures with Ge-modified interfaces Applied Surface Science. ,vol. 184, pp. 79- 83 ,(2001) , 10.1016/S0169-4332(01)00480-9
F. Yan, Y.D. Zheng, P. Chen, L. Sun, S.L. Gu, SiC heteroepitaxial growth by low pressure chemical vapor deposition on Si(1 1 1) substrates Optical Materials. ,vol. 23, pp. 113- 116 ,(2003) , 10.1016/S0925-3467(03)00070-3
Jörg Pezoldt, György Vida, M. Rouhani Laridjani, M. Averous, T. Wöhner, J.A. Schaefer, Thomas Stauden, Gernot Ecke, R. Pieterwas, Lothar Spieß, The Influence of Foreign Atoms on the early Stages of SiC Growth on (111)Si Materials Science Forum. pp. 289- 292 ,(2000) , 10.4028/WWW.SCIENTIFIC.NET/MSF.338-342.289
P Masri, N Moreaud, M Rouhani Laridjani, J Calas, M Averous, G Chaix, A Dollet, R Berjoan, C Dupuy, The physics of heteroepitaxy of 3C-SiC on Si : role of Ge in the optimization of the 3C-SiC/Si heterointerface Materials Science and Engineering B-advanced Functional Solid-state Materials. pp. 535- 538 ,(1999) , 10.1016/S0921-5107(98)00468-1
FM Morales, Ch Zgheib, SI Molina, D Araújo, R García, C Fernández, A Sanz‐Hervás, P Masri, P Weih, Th Stauden, V Cimalla, O Ambacher, J Pezoldt, None, The role of Ge predeposition temperature in the MBE epitaxy of SiC on Ssilicon Physica Status Solidi (c). ,vol. 1, pp. 341- 346 ,(2004) , 10.1002/PSSC.200303940
Stefan Rohmfeld, Martin Hundhausen, Lothar Ley, Christian A. Zorman, Mehran Mehregany, Quantitative evaluation of biaxial strain in epitaxial 3C-SiC layers on Si(100) substrates by Raman spectroscopy Journal of Applied Physics. ,vol. 91, pp. 1113- 1117 ,(2002) , 10.1063/1.1427408
H. P. Liaw, R. F. Davis, Thermal stresses in heteroepitaxial beta silicon carbide thin films grown on silicon substrates Journal of The Electrochemical Society. ,vol. 131, pp. 3014- 3018 ,(1984) , 10.1149/1.2115458
J. Pezoldt, Ch. Zgheib, P. Masri, M. Averous, F. M. Morales, R. Kosiba, G. Ecke, P. Weih, O. Ambacher, SIMS investigation of the influence of Ge pre-deposition on the interface quality between SiC and Si Surface and Interface Analysis. ,vol. 36, pp. 969- 972 ,(2004) , 10.1002/SIA.1814