Formation of amorphous layers by ion implantation
作者： S. Prussin , David I. Margolese , Richard N. Tauber
DOI: 10.1063/1.334840
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摘要: … In our paper I, we measured the amorphous layer depths for these three implant energies for a Waycool implantation over the dose range ofS X 1014_1 X 1016 As cm-2 into 1100} …
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