作者: Sima Yaghoubian , Seyed Hadi Zandavi , C. A. Ward
DOI: 10.1039/C6CP02713J
关键词:
摘要: The adsorption of heptane vapour on a smooth silicon substrate with lower temperature than the is examined analytically and experimentally. An expression for amount adsorbed under steady state conditions derived from molecular cluster model adsorbate that similar to one used derive equilibrium Zeta isotherm. in each series experiments measured using UV-vis interferometer, gives strong support predicted be adsorbed. distribution predict subcooling required make disorder–order phase transition become an liquid, found 2.7 ± 0.4 K. continuum approach predicting thickness liquid film originally developed by Nusselt compared over-predict three-orders magnitude.