Multiscale modeling of doping processes in advanced semiconductor devices
作者： Nikolas Zographos , Christoph Zechner , Ignacio Martin-Bragado , Kyuho Lee , Yong-Seog Oh
DOI: 10.1016/J.MSSP.2016.10.037
关键词:
摘要: … including different process steps and effects such as ion implantation, dopant and defect … will focus on process simulation for doping processes in advanced semiconductor devices. …
sci-hub.se 参考文章(90)
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