Double magnetron self-sputtering in HiPIMS discharges

摘要: There is an increasing concern that high power impulse magnetron sputtering (HiPIMS) systems are being disadvantaged by relatively low deposition rates compared with traditional dc magnetrons operating at the same average input. Nevertheless, a minimization of losses ionized and neutral species possible in HiPIMS discharges. In described configuration, majority metal ions escaping discharge volume can be either used for or, if they fail to reach substrate, maintenance when charge redistribution from one ionization area other takes place. The anode-to-cathode configuration allows neutrals, which not deposited on guided instantaneous cathode or re-sputtered. For input, it becomes increase self-sputtering efficiency, rate obtain versatile control over film microstructure.