Observation of Ti4+ ions in a high power impulse magnetron sputtering plasma
作者： Joakim Andersson , Arutiun P. Ehiasarian , André Anders
DOI: 10.1063/1.2973179
关键词: Ion 、 Sputter deposition 、 Plasma 、 Secondary electrons 、 High-power impulse magnetron sputtering 、 Sputtering 、 Secondary emission 、 Mass spectrometry 、 Chemistry 、 Atomic physics
摘要: Multiply charged titanium ions including Ti4+ were observed in high power impulse magnetron sputtering discharges. Mass/charge spectrometry was used to identify metal ion species. Quadruply identified by isotope-induced broadening at mass/charge 12. Due their potential energy, give a yield of secondary electrons, which turn are likely be responsible for the generation multiply states.
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