Plasma diagnostics for understanding the plasma?surface interaction in HiPIMS discharges: a review

作者: Nikolay Britun , Tiberiu Minea , Stephanos Konstantinidis , Rony Snyders

DOI: 10.1088/0022-3727/47/22/224001

关键词: SputteringHigh-power impulse magnetron sputteringEngineering physicsSputter depositionCavity magnetronNanotechnologyPlasmaMaterials sciencePlasma diagnosticsCathodePlasma surface interaction

摘要: … of the plasma phase generated in HiPIMS discharges. This is … the modelling studies of a HiPIMS discharge, which are still … in the domain of HiPIMS discharge characterization, obtained …

参考文章(329)
Igor I. Sobel’man, Leonid A. Vainshtein, Evgenii A. Yukov, Broadening of Spectral Lines Introduction to the Theory of Atomic Spectra#R##N#International Series of Monographs in Natural Philosophy. pp. 237- 296 ,(1995) , 10.1007/978-3-642-57825-0_7
I. Katsumata, A Review of Ion Sensitive Probes Contributions to Plasma Physics. ,vol. 36, pp. 73- 79 ,(1996) , 10.1002/CTPP.19960360112
J Alami, J T Gudmundsson, J Bohlmark, J Birch, U Helmersson, Plasma dynamics in a highly ionized pulsed magnetron discharge Plasma Sources Science and Technology. ,vol. 14, pp. 525- 531 ,(2005) , 10.1088/0963-0252/14/3/015
K. Shibagaki, N. Nafarizal, K. Sasaki, Spatial distribution of the velocity distribution function of Fe atoms in a magnetron sputtering plasma source Journal of Applied Physics. ,vol. 98, pp. 043310- ,(2005) , 10.1063/1.2035311
J Benedikt, A Hecimovic, D Ellerweg, A von Keudell, Quadrupole mass spectrometry of reactive plasmas Journal of Physics D. ,vol. 45, pp. 403001- ,(2012) , 10.1088/0022-3727/45/40/403001
N Brenning, D Lundin, T Minea, C Costin, C Vitelaru, Spokes and charged particle transport in HiPIMS magnetrons Journal of Physics D. ,vol. 46, pp. 084005- ,(2013) , 10.1088/0022-3727/46/8/084005
Carolyn Rubin Aita, Glow discharge mass spectrometry for sputtering discharge diagnostics Journal of Vacuum Science and Technology. ,vol. 3, pp. 625- 630 ,(1985) , 10.1116/1.572965
H. Kersten, G.M.W. Kroesen, R. Hippler, On the energy influx to the substrate during sputter deposition of thin aluminium films Thin Solid Films. ,vol. 332, pp. 282- 289 ,(1998) , 10.1016/S0040-6090(98)01067-0