Fabrication of MFIS-FETs using PLZT/STO/Si(100) structures

作者: E. Tokumitsu , R. Nakamura , H. Ishiwara

DOI: 10.1109/ISAF.1996.602719

关键词:

摘要: … overcome these difficulties, we use a SrTiO,(STO) buffer layer to grow the PLZT films OR Si … of STO(70 nm)/Si structures without a ferroelectric PLZT layer as shown in Fig. 1. STO layers …

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