On the Kinetics of the Thermal Oxidation of Silicon II . Some Theoretical Evaluations
作者： William A. Tiller
DOI: 10.1149/1.2129723
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ecsdl.org参考文章(2)
W. D. Kingery, G. P. Smith, Kinetics of High-Temperature Processes Journal of The Electrochemical Society. ,vol. 107, pp. 84C- ,(1960) , 10.1149/1.2427666
W.Beall Fowler, The physics of SiO2 and its interfaces Journal of Colloid and Interface Science. ,vol. 78, pp. 280- ,(1980) , 10.1016/0021-9797(80)90528-7