Wavefront measuring apparatus and wavefront measuring method

作者: Hiroyuki Nishida

DOI:

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摘要: A wavefront measuring apparatus and a method are capable of performing optical measurement on test system, including an immersion with comparable ease handling to that the conventional using concave member, substantially independently reflection may occur at surface closest system among surfaces member for reflecting light exiting from system. The has source, reference path in which producing is disposed, disposed. plano-convex wall thickness approximately equal radius curvature convex thereof disposed such manner plane faces toward space between filled liquid.

参考文章(3)
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純一 北川, Junichi Kitagawa, Analysis/evaluation device for optical lens ,(1995)
Osamu Kakuchi, Eiichi Murakami, Projection exposure apparatus ,(2000)