Modeling for calculation of vanadium oxide film composition in reactive-sputtering process
作者： He Yu , Yadong Jiang , Tao Wang , Zhiming Wu , Junsheng Yu
DOI: 10.1116/1.3400232
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摘要: A modified model describing the changing ratio of vanadium to oxide on target and substrate as a function oxygen flow is described. Actually, this extremely sensitive deposition conditions during (VOx) reactive magnetron-sputtering process. The method in article an extension previously presented Berg’s model, where only single stoichiometry compound layer was taken into consideration. This work deals with magnetron sputtering films different contents from metal target. presence mixed oxides at both surface produced reactive-sputtering process are included. It shows that can be used for optimization film composition respect stable hysteresis-free systematic experimental study rate VOx ion current also made. Compared results, it w...
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