Applications of infrared absorption spectroscopy to the microelectronics industry
作者： Y.J. Chabal , Krishnan Raghavachari
DOI: 10.1016/S0039-6028(01)01896-9
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摘要: A review is presented of infrared absorption studies that are closely linked to the issues silicon processing important for microelectronics community. In particular, we focus attention on contributions wet chemical (HF etching) and surface passivation (oxidation).
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