Effect of Systematic Control of Pd Thickness and Annealing Temperature on the Fabrication and Evolution of Palladium Nanostructures on Si (111) via the Solid State Dewetting.
作者： Sundar Kunwar , Puran Pandey , Mao Sui , Quanzhen Zhang , Ming-Yu Li
DOI: 10.1186/S11671-017-2138-1
关键词:
摘要: Si-based optoelectronic devices embedded with metallic nanoparticles (NPs) have demonstrated the NP shape, size, spacing, and crystallinity dependent on light absorption emission induced by localized surface plasmon resonance. In this work, we demonstrate various sizes configurations of palladium (Pd) nanostructures Si (111) systematic thermal annealing variation Pd thickness temperature. The evolution are systematically controlled dewetting thin film means diffusion in conjunction interface energy minimization Volmer-Weber growth model. Depending control deposition amount ranging between 0.5 100 nm at temperatures, four distinctive regimes demonstrated: (i) small pits grain formation, (ii) nucleation NPs, (iii) lateral (iv) merged nanostructures. addition, 300 800 °C, show grains, isolated finally, NP-assisted nanohole formation along decomposition Pd-Si inter-diffusion. Raman analysis showed discrepancies phonon modes such that decreased peak intensity left shift after fabrication Furthermore, UV-VIS-NIR reflectance spectra revealed existence morphology absorption, scattering, properties.
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