作者: Arjun Dey , Manish Kumar Nayak , A. Carmel Mary Esther , Maurya Sandeep Pradeepkumar , Deeksha Porwal
DOI: 10.1038/SREP36811
关键词:
摘要: Vanadium oxide-molybdenum oxide (VO-MO) thin (21–475 nm) films were grown on quartz and silicon substrates by pulsed RF magnetron sputtering technique altering the power from 100 to 600 W. Crystalline VO-MO showed mixed phases of vanadium oxides e.g., V2O5, V2O3 VO2 along with MoO3. Reversible or smart transition was found occur just above room temperature i.e., at ~45–50 °C. The deposited a gradual decrease in transmittance increase film thickness. But, exhibited reflectance that significantly lower than substrate. Further, effect low (i.e., 100 °C) vacuum (10−5 mbar) annealing optical properties solar absorptance, as well constants band gap, refractive index extinction coefficient studied. Sheet resistance, oxidation state nanomechanical nanohardness elastic modulus also investigated as-deposited condition after treatment. Finally, combination nanoindentation finite element modeling (FEM) employed investigate yield stress von Mises distribution films.