Sputter profiling of passive films in Fe–Cr alloys: A quantitative approach by Auger electron spectroscopy

摘要: The study deals with Auger electron spectroscopy depth profiling of passive films grown on Fe–Cr and Fe–Cr–Mo alloys. Sputter profiles are shown to follow exponential laws related in overlayers the kinetic energy electrons (inelastic mean‐free‐path effect). For Cr Fe LMV transitions, can be decomposed interface region two contributions produced, respectively, by oxidized species film metallic elements ‘‘seen’’ from alloy substrate throughout this thin (< 4 nm). method provides an internal estimate sputter rate oxide layers. With a previous calibration intensities pure oxides alloys, quantitative distribution is proposed assuming layer‐by‐layer etching model.