ESCA for microelectronic applications
作者： J. F. Moulder , J. M. Burkstrand , C. D. Wagner
DOI: 10.1017/S0424820100074665
关键词:
摘要:
sci-hub.st 参考文章(7)
J.E. Castle, R.H. West, Bremsstrahlung-induced Auger peaks Journal of Electron Spectroscopy and Related Phenomena. ,vol. 18, pp. 355- 358 ,(1980) , 10.1016/0368-2048(80)80024-7
C. D. Wagner, L. H. Gale, R. H. Raymond, Two-dimensional chemical state plots: a standardized data set for use in identifying chemical states by x-ray photoelectron spectroscopy Analytical Chemistry. ,vol. 51, pp. 466- 482 ,(1979) , 10.1021/AC50040A005
P.H. Holloway, G.E. McGuire, Characterization of electronic devices and materials by surface-sensitive analytical techniques Applications of Surface Science. ,vol. 4, pp. 410- 444 ,(1980) , 10.1016/0378-5963(80)90088-4
C.D. Wagner, J.Ashley Taylor, Generation of XPS Auger lines by bremsstrahlung Journal of Electron Spectroscopy and Related Phenomena. ,vol. 20, pp. 83- 93 ,(1980) , 10.1016/0368-2048(80)85008-0
C.R. Brundle, Chemical characterization of surfaces and interfaces of industrial materials by X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary ion mass spectrometry☆ Thin Solid Films. ,vol. 72, pp. 3- 8 ,(1980) , 10.1016/0040-6090(80)90552-0
Alberto Torrisi, Salvatore Pignataro, Giovanni Nocerino, Applications of ESCA to fabrication problems in the semiconductor industry Applications of Surface Science. ,vol. 13, pp. 389- 401 ,(1982) , 10.1016/0378-5963(82)90006-X
C. D. Wagner, X‐ray photoelectron spectroscopy with x‐ray photons of higher energy Journal of Vacuum Science and Technology. ,vol. 15, pp. 518- 523 ,(1978) , 10.1116/1.569459