Interferometric Determination of Apparent Thickness of Coatings

摘要: THE thickness of deposit from an atomic beam is measured as follows. The film (X) deposited on a high-grade flat through grid-like mask thin metal held in close contact. Then the removed flat, and highly reflective opaque coating (Y) evaporated over whole. steps surface which are edges X, appear Y. A second with but slightly transparent (Z) then brought up, interferometer thus formed examined by reflected system multiple precision fringes equal thickness1. accompanying reproduction, was taken parallel green light filtered mercury arc, shows appearance X = 569 A.