Method for causing plasma reaction under atmospheric pressure

摘要: The invention provides a method of treating the surface substrate with reactive plasma which comprises exciting reagent gas in reaction vessel having pair opposing electrodes to produce glow discharge at atmospheric pressure and causing or permitting contact said substrate. can be used for forming thin film on and/or reforming under pressure. also an apparatus comprising (1) containing upper (2) lower electrode (3); may comprise plurality vertical fine wires solid dielectric (4) provided either both electrodes. A perforated pipe (8) assist uniform distribution near (5) treated. By using above-mentioned construction, highly stable uniformly dispersed obtained without occurrence arc discharge, even if consists conductive material, such as metal alloy.