Method and device for surface treatment with a plasma at atmospheric pressure
作者： Alain Villermet , Eric Gat , Gamal Gouda , Nicolas Gherardi , Francoise Massines
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摘要: Method for creating an electric discharge in initial gas which is at atmospheric pressure and lies between two exciting electrodes, comprising applying a supply voltage to the electrodes AC whose amplitude frequency are adapted order maintain (1) least portion of components excited state, and/or (2) presence electrons, successive half-cycles voltage.
lens.org 参考文章(9)
Shigenori Hayashi, Shunpei Yamazaki, Method for depositing a film ,(1993)
Satiko Okazaki, Masuhiro Ogoma, Method of monitoring atmospheric pressure glow discharge plasma ,(1992)
Masuhiro Kogoma, Sachiko Okazaki, Method for causing plasma reaction under atmospheric pressure ,(1989)
Kazuo Naito, Masato Yoshikawa, Yukihiro Kusano, Yukio Fukuura, Satiko Okazaki, Masuhiro Kogoma, Surface treatment method ,(1988)
Satiko Okazaki, Hiroshi Uchiyama, Masuhiro Kogoma, Atmospheric pressure plasma surface treatment process ,(1991)
Hideo Inagaki, Atsushi Nishiwaki, Norihito Ikemiya, Kazumi Ogino, Hiroshi Uchiyama, Yasuo Sawada, Method for the surface treatment of a metal by atmospheric pressure plasma ,(1993)
Mounir Laroussi, Larry Clifton Wadsworth, Paul Daniel Spence, Chaoyu Liu, Peter Ping-Yi Tsai, John Reece Roth, Method and apparatus for glow discharge plasma treatment of polymer materials at atmospheric pressure ,(1994)
Dominique Jouvaud, Frank Slootman, Pascal Bouard, François Coeuret, Eckhard Prinz, Process for creating a deposit of silicon oxide on a traveling solid substrate ,(1994)