Michael D. Austin, Haixiong Ge, Wei Wu, Mingtao Li, Zhaoning Yu, D. Wasserman, S. A. Lyon, Stephen Y. Chou,
Fabrication of 5 nm linewidth and 14 nm pitch features by nanoimprint lithography Applied Physics Letters. ,vol. 84, pp. 5299- 5301 ,(2004) ,
10.1063/1.1766071