TWO-PHOTON STEREOLITHOGRAPHY

摘要: Two-photon stereolithography based on photopolymerization provides the ability to fabricate real three-dimensional (3D) microstructures beyond resolution of focal size. In this paper, our recent research focusing improvement spatial in two-photon is reviewed. The influence system and fabrication conditions relation discussed. For small low aspect ratio voxels, a minimum power exposure time (MPMT) scheme introduced. During process, an ascending technique, wherein truncation amount volumetric pixels controlled, can be applied improve two-dimensional patterns. 3D Microfabrication with less than 100 nm realized by using radical quenching effect. After fabricated patterns refined 60 post-processing plasma ashing.