Photodeposition of Ti and application to direct writing of Ti:LiNbO3 waveguides
作者： J. Y. Tsao , R. A. Becker , D. J. Ehrlich , F. J. Leonberger
DOI: 10.1063/1.94027
关键词:
摘要: An ultraviolet laser photodeposition process based on the photolysis of TiCl4 has been developed. The photochemistry this new metal‐halide system shown to involve a surface‐catalyzed reaction confined adsorbed molecular layers. By using process, Ti films have deposited LiNbO3 form, after diffusion, 4‐μm‐wide single‐mode channel waveguides comparable quality conventionally fabricated Ti‐indiffused guides. technique introduces design flexibility into waveguide fabrication, permitting controlled gradations in diffused index change and lateral width along guide.
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