Transfer device and processing system having the same

作者: Youhei Yamada

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摘要: A transfer device includes a base; and substrate supporter for supporting one or more target substrates to be processed. The is forwardly backwardly moved the substrates. further reflecting bodies provided at least above below supporter, serving reflect heats radiated from supported by supporter.

参考文章(16)
Michael W. Pippins, Richard S. Muka, Mitchell A. Drew, Batchloader for load lock ,(1997)
Jhin-Siang Jhong, Chen Lung Huang, Jen Jui Cheng, Mini clean room for preventing wafer pollution and using method thereof ,(2008)
Masao Takikawa, Katsumi Ishii, Wafer container and wafer aligning apparatus ,(1993)
Hideaki Watanabe, Toshihiko Miyajima, Tetsuo Takahashi, Eisaku Miyauchi, Apparatus for clean transfer of objects ,(1992)
Yoichi Uchimaki, Yuko Egawa, Tetsunori Kaji, System for producing wafers ,(2002)