Sources and methods of repetitively pulsed ion/plasma material treatment

摘要: A brief review is presented on repetitively pulsed ‘‘Raduga 1–4’’ ion sources based evaporation of the cathode material by vacuum arc. Their operation principles and functional possibilities are described. ‘‘Raduga‐1,3’’ provide a formation one component multicomponent, not composition‐controlled high intensity beams. Ion ‘‘Raduga‐2,4’’ generate energy/composition‐controlled multicomponent Operation conditions providing treatment details complex shape as well plasma target given. Features prospects methods multielement concentration implantation discussed. The method realized under ion/plasma operating source ‘‘Raduga’’ sputtering compensation deposition.