VACUUM ARC ION SOURCES : SOME VACUUM ARC BASICS AND RECENT RESULTS (INVITED)

摘要: Vacuum arc ion sources have been developed and used in a growing number of laboratories around the world. Primary applications this high current metal source evolved for metallurgical implantation accelerator injection. Novel versions features developed, including an electronically switchable ‘‘partitioned cathode’’ whereby species generated can be switched from pulse to pulse, combined metal/gaseous with long lasting trigger, low energy (∼1 keV) miniature version, broad beam (50 cm diam extractor) multicathode version. Progress has made also characterization manipulation plasma prior extraction, e.g., understanding charge states produced development macroparticle‐removing magnetic filters. Advances vacuum design operation accompanied by deeper production cathode spots, several explained specifics formation within spots. Here we present short overview some fundamental processes examine recent developments application.