Low jitter metal vapor vacuum arc ion source for electron beam ion trap injections
作者： Glenn E. Holland , Craig N. Boyer , John F. Seely , J. N. Tan , J. M. Pomeroy
DOI: 10.1063/1.1948396
关键词:
摘要: We describe a metal vapor vacuum arc (MeVVA) ion source containing eight different cathodes that are individually selectable via the control electronics which does not require moving components in vacuum. Inside assembly, plasma is produced by means of 30μs pulse (26kV,125A) delivering 2.4mC charge to cathode sample material. The trigger jitter minimized (<200ns) improve capture efficiency ions injected into an trap. During single discharge, over-damped produces flux 8.4×109ions∕cm2, measured unbiased Faraday cup positioned 20cm from extractor grid, at discharge rates up 5Hz. electronic triggering fiber optic interface. present design, fabrication details, and performance this MeVVA, recently installed on National Institute Standards Technology electron beam trap (EBIT).
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