Field effect transistor memory device

作者: Xiaogan Liang , Hongsuk Nam , Mikai Chen , Sungjin Wi

DOI:

关键词:

摘要: A method for generating a non-volatile memory device may comprise: applying plasma preset time period to an exposed surface of channel field effect transistor such that plurality charge-trapping sites are formed at the channel. The is comprised multi-layer structure atomically thin two-dimensional sheets.

参考文章(14)
Barbaros Oezyilmaz, Guang Xin Ni, Chee Tat Toh, Yi Zheng, Graphene memory cell and fabrication methods thereof ,(2009)
Makarand Paranjape, Paola Barbara, Amy Liu, Marcio Fontana, Method and system for generating a photo-response from mos2 schottky junctions ,(2012)
Fredericus Johannes Touwslager, Albert W. Marsman, Dagobert Michel De Leeuw, Gerwin Hermanus Gelinck, Non-volatile ferroelectric thin film device using an organic ambipolar semiconductor and method for processing such a device ,(2004)
Byung Gyu Chae, Yong Sik Lim, Kwang Yong Kang, Gyungock Kim, Sunglyul Maeng, Hyun Tak Kim, Doo Hyeb Youn, Seong Hyun Kim, 2-terminal semiconductor device using abrupt metal-insulator transition semiconductor material ,(2004)
Ye Zhou, Su-Ting Han, Prashant Sonar, V. A. L. Roy, Nonvolatile multilevel data storage memory device from controlled ambipolar charge trapping mechanism Scientific Reports. ,vol. 3, pp. 2319- 2319 ,(2013) , 10.1038/SREP02319
Vitaly Podzorov, Christian Kloc, Ernst Bucher, Michael E. Gershenson, Field-effect transistors with weakly coupled layered inorganic semiconductors ,(2004)
Sung Myung, Jiwoon Im, Minbaek Lee, Seunghun Hong, Semiconductor devices and methods of manufacturing and operating same ,(2008)