Heat treatment apparatus and method
作者： Wataru Ohkase
DOI:
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摘要: A heat treatment apparatus comprising rays radiating means having a sheet-like section, process tube radiated and heated by shot from the for carrying substrate, which has surface of semiconductor film and/or dielectric to be treated, into out tube, wherein said substrate is positioned section in such way that incident angle onto peripheral portion treated becomes smaller than 60°, so absorptivity at can increased.
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