Unbalanced magnetic field configuration: plasma and film properties
作者： SE Rodil , JJ Olaya , None
DOI: 10.1088/0953-8984/18/32/S02
关键词:
摘要: Coatings of CrN, TiN, ZrN, TaN and NbN were deposited using an unbalanced magnetron sputtering system with two different degrees unbalancing to investigate the effect degree on both plasma characteristics film properties. The was determined by extensive characterization magnetic field fluxes in X-Z plane perpendicular target. Then, parameters, such as electron temperature, potential, density ion current density, obtained for each target a function unbalance coefficient. microstructure, hardness, corrosion wear resistant measured determine these results suggested that unbalancing, through variations induced bombardment ionization, had strong influence microstructure preferred orientation.
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sci-hub.se 参考文章(39)
E.E. Stansbury, R.A. Buchanan, Fundamentals of Electrochemical Corrosion ,(2000)
J.H. Scofield, Theoretical photoionization cross sections from 1 to 1500 keV. ,(1973) , 10.2172/4545040
B. Window, N. Savvides, Charged particle fluxes from planar magnetron sputtering sources Journal of Vacuum Science and Technology. ,vol. 4, pp. 196- 202 ,(1986) , 10.1116/1.573470
P. J. Kelly, R. D. Arnell, Development of a novel structure zone model relating to the closed-field unbalanced magnetron sputtering system Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. ,vol. 16, pp. 2858- 2869 ,(1998) , 10.1116/1.581432
C Mitterer, PH Mayrhofer, W Waldhauser, Ergün Kelesoglu, P Losbichler, None, The influence of the ion bombardment on the optical properties of TiNx and ZrNx coatings Surface & Coatings Technology. pp. 230- 235 ,(1998) , 10.1016/S0257-8972(98)00651-3
Siegfried Hofmann, Target and substrate surface reaction kinetics in magnetron sputtering of nitride coatings Thin Solid Films. ,vol. 191, pp. 335- 348 ,(1990) , 10.1016/0040-6090(90)90384-P
P.J Kelly, R.D Arnell, The influence of magnetron configuration on ion current density and deposition rate in a dual unbalanced magnetron sputtering system Surface & Coatings Technology. ,vol. 108, pp. 317- 322 ,(1998) , 10.1016/S0257-8972(98)00566-0
C.-H. Ma, J.-H. Huang, Haydn Chen, Texture evolution of transition-metal nitride thin films by ion beam assisted deposition Thin Solid Films. ,vol. 446, pp. 184- 193 ,(2004) , 10.1016/J.TSF.2003.09.063
S.M. Hsu, Ming Shen, Wear prediction of ceramics Wear. ,vol. 256, pp. 867- 878 ,(2004) , 10.1016/J.WEAR.2003.11.002
I. Petrov, P. B. Barna, L. Hultman, J. E. Greene, Microstructural evolution during film growth Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. ,vol. 21, pp. S117- S128 ,(2003) , 10.1116/1.1601610