作者: L. N. Ismail , M. N. A. Sauqi , Z. Habibah , S. H. Herman , M. N. Asiah
DOI: 10.1109/SCORED.2013.7002620
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摘要: This paper investigated the effect of dielectric thickness to electrical properties metal-insulator-semiconductor (MIS) device. The MIS device were fabricated having PMMA:TiO 2 and ZnO as semiconductor layer, respectively. nancomposite film deposited at different deposition speed from 1000, 2000, 3000, 4000, 5000, 6000 rpm. Results showed that there is difference in nanocomposite when varying speed. As spin increased, layer was reduced. performance degraded decreased. AFM image observed have an agglomeration particles on films. Roughness increased are increased.