Enhancing electrical conductivity of room temperature deposited Sn-doped In2O3 thin films by hematite seed layers
作者： Wolfram Jaegermann , Joachim Brötz , Andreas Klein , Christian Lohaus , Céline Steinert
DOI: 10.1063/1.5022683
关键词:
摘要: Hematite Fe2O3 seed layers are shown to constitute a pathway prepare highly conductive transparent tin-doped indium oxide thin films by room temperature magnetron sputtering. Conductivities of up σ = 3300 S/cm observed. The improved conductivity is not restricted the interface but related an enhanced crystallization films, which proceeds in rhombohedral phase.
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C. Körber, V. Krishnakumar, A. Klein, G. Panaccione, P. Torelli, A. Walsh, J. L. F. Da Silva, S.-H. Wei, R. G. Egdell, D. J. Payne, Electronic structure of In 2 O 3 and Sn-doped In 2 O 3 by hard x-ray photoemission spectroscopy Physical Review B. ,vol. 81, pp. 165207- ,(2010) , 10.1103/PHYSREVB.81.165207
Toshio Kamiya, Hideo Hosono, Material characteristics and applications of transparent amorphous oxide semiconductors NPG Asia Materials. ,vol. 2, pp. 15- 22 ,(2010) , 10.1038/ASIAMAT.2010.5
Klaus Ellmer, Past achievements and future challenges in the development of optically transparent electrodes Nature Photonics. ,vol. 6, pp. 809- 817 ,(2012) , 10.1038/NPHOTON.2012.282
Hiromichi Ohta, Masahiro Orita, Masahiro Hirano, Hiroaki Tanji, Hiroshi Kawazoe, Hideo Hosono, Highly electrically conductive indium–tin–oxide thin films epitaxially grown on yttria-stabilized zirconia (100) by pulsed-laser deposition Applied Physics Letters. ,vol. 76, pp. 2740- 2742 ,(2000) , 10.1063/1.126461
Y. Gassenbauer, R. Schafranek, A. Klein, S. Zafeiratos, M. Hävecker, A. Knop-Gericke, R. Schlögl, Surface states, surface potentials, and segregation at surfaces of tin-doped In2O3 Physical Review B. ,vol. 73, pp. 245312- ,(2006) , 10.1103/PHYSREVB.73.245312
Luke A. Dunlop, Ahmed Kursumovic, Judith L. MacManus-Driscoll, Highly Conducting, Transparent Rhombic/Cubic Indium Tin Oxide Nanocomposite Thin Films Crystal Growth & Design. ,vol. 10, pp. 1730- 1735 ,(2010) , 10.1021/CG901384D
Mareike V. Hohmann, André Wachau, Andreas Klein, In situ Hall effect and conductivity measurements of ITO thin films Solid State Ionics. ,vol. 262, pp. 636- 639 ,(2014) , 10.1016/J.SSI.2013.10.004
C. Nunes de Carvalho, A. Luis, G. Lavareda, E. Fortunato, A. Amaral, Effect of thickness on the properties of ITO thin films deposited by RF- PERTE on unheated, flexible, transparent substrates Surface & Coatings Technology. pp. 252- 256 ,(2002) , 10.1016/S0257-8972(01)01641-3
Kenji Nomura, Hiromichi Ohta, Akihiro Takagi, Toshio Kamiya, Masahiro Hirano, Hideo Hosono, Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors Nature. ,vol. 432, pp. 488- 492 ,(2004) , 10.1038/NATURE03090
P. D. C. King, T. D. Veal, F. Fuchs, Ch. Y. Wang, D. J. Payne, A. Bourlange, H. Zhang, G. R. Bell, V. Cimalla, O. Ambacher, R. G. Egdell, F. Bechstedt, C. F. McConville, Band gap, electronic structure, and surface electron accumulation of cubic and rhombohedral In 2 O 3 Physical Review B. ,vol. 79, pp. 205211- ,(2009) , 10.1103/PHYSREVB.79.205211