MICROSTRUCTURE AND MECHANICAL PROPERTIES OF PULSED LASER DEPOSITED BORON NITRIDE FILMS

摘要: Abstract Boron nitride films were prepared by pulsed laser ablation from a boron target using KrF-excimer laser, where the growing deposited in nitrogen atmosphere or bombarded nitrogen/argon ion beam. Films without at weak bombardment (such will be called l-BN this paper) are hexagonal with amorphous to turbostratic microstructure (l-BN) and show high adhesive strength silicon stainless steel substrates. By them as intermediate layers, adhesion of pure cubic (c-BN) can significantly improved. l-BN/h-BN/c-BN layer systems have been investigated in-situ ellipsometry, infrared spectroscopy cross-section plan-view high-resolution transmission electron microscopy, including diffraction. The mechanical properties, i.e. stress hardness, these presented. higher energy densities compressive stresses 11.5 GPa. lower range 4.7 1.3 GPa Vickers hardness 18.6 7.5 GPa depending on substrate temperature bombardment. 400 nm thick adherent c-BN estimated 4.5 GPa.