作者: Ken Elen , Boris Capon , Christopher De Dobbelaere , Daan Dewulf , Nick Peys
DOI: 10.1016/J.TSF.2013.05.104
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摘要: Abstract Transparent conducting oxide (TCO) films of titania doped with vanadium (V), niobium (Nb) and tantalum (Ta) are obtained by aqueous Chemical Solution Deposition (CSD). The effect the dopant on crystallization microstructure resulting is examined means X-ray diffraction electron microscopy. During annealing thin films, in-situ characterization crystal structure sheet resistance carried out. Niobium anatase after in forming gas, show a resistivity 0,28 Ohm cm, which lowest reported for solution deposited anatase-based TCO so far. Here, we demonstrate that CSD may provide strategy scalable production future.