Absolute density and temperature of O(D21) in highly Ar or Kr diluted O2 plasma

作者: Keigo Takeda , Seigo Takashima , Masafumi Ito , Masaru Hori

DOI: 10.1063/1.2957679

关键词:

摘要: The absolute density and translational temperature of excited O atoms [O(D21)] in O2 surface-wave-excited plasmas (SWPs) with high Kr or Ar dilution were measured by using vacuum ultraviolet laser absorption spectroscopy. It was observed that the O(D21) Kr∕O2 SWP lower than Ar∕O2 above a pressure 90Pa, had an elevated around 2000K SWPs. Furthermore, flux identified as key parameter oxidation process. These results are very important knowledge relevant to plasma oxidation.

参考文章(11)
Keigo Takeda, Yoshiki Kubota, Seigo Takashima, Masaru Hori, Anna Serdyuchenko, Masafumi Ito, Yutaka Matsumi, Diagnostics of surface wave excited Kr/O2 plasma for low-temperature oxidation processes Journal of Applied Physics. ,vol. 102, pp. 013302- ,(2007) , 10.1063/1.2752549
Tomo Ueno, Ayuka Morioka, Shingo Chikamura, Yoshitaka Iwasaki, Low-Temperature and Low-Activation-Energy Process for the Gate Oxidation of Si Substrates Japanese Journal of Applied Physics. ,vol. 39, pp. 327- ,(2000) , 10.1143/JJAP.39.L327
Shigekazu Tada, Seigou Takashima, Masafumi Ito, Masaru Hori, Toshio Goto, Yuichi Sakamoto, Measurement and control of absolute nitrogen atom density in an electron-beam-excited plasma using vacuum ultraviolet absorption spectroscopy Journal of Applied Physics. ,vol. 88, pp. 1756- 1759 ,(2000) , 10.1063/1.1305559
Seigou Takashima, Masaru Hori, Toshio Goto, Akihiro Kono, Masafumi Ito, Katsumi Yoneda, Vacuum ultraviolet absorption spectroscopy employing a microdiacharge hollow-cathode lamp for absolute density measurements of hydrogen atoms in reactive plasmas Applied Physics Letters. ,vol. 75, pp. 3929- 3931 ,(1999) , 10.1063/1.125497
Takayuki Ohta, Masaru Hori, Tetsuro Ishida, Toshio Goto, Masafumi Ito, Satoru Kawakami, Study on the Absolute Density and Translational Temperature of Si Atoms in Very High Frequency Capacitively Coupled SiH4Plasma with Ar, N2, and H2Dilution Gases Japanese Journal of Applied Physics. ,vol. 43, pp. 6405- 6412 ,(2004) , 10.1143/JJAP.43.6405
Seigou Takashima, Shigeo Arai, Masaru Hori, Toshio Goto, Akihiro Kono, Masafumi Ito, Katsumi Yoneda, Development of vacuum ultraviolet absorption spectroscopy technique employing nitrogen molecule microdischarge hollow cathode lamp for absolute density measurements of nitrogen atoms in process plasmas Journal of Vacuum Science and Technology. ,vol. 19, pp. 599- 602 ,(2001) , 10.1116/1.1340655
Hisao Nagai, Mineo Hiramatsu, Masaru Hori, Toshio Goto, Measurement of oxygen atom density employing vacuum ultraviolet absorption spectroscopy with microdischarge hollow cathode lamp Review of Scientific Instruments. ,vol. 74, pp. 3453- 3459 ,(2003) , 10.1063/1.1582386
Masashi Goto, Kazufumi Azuma, Tetsuya Okamoto, Yukihiko Nakata, Surface Wave Plasma Oxidation at Low Temperature under Rare Gas Dilution Japanese Journal of Applied Physics. ,vol. 42, pp. 7033- 7038 ,(2003) , 10.1143/JJAP.42.7033
K. Sekine, Y. Saito, M. Hirayama, T. Ohmi, Highly reliable ultrathin silicon oxide film formation at low temperature by oxygen radical generated in high-density krypton plasma IEEE Transactions on Electron Devices. ,vol. 48, pp. 1550- 1555 ,(2001) , 10.1109/16.936559