Phase-shift mask, manufacturing method thereof and manufacturing method of semiconductor element
作者： Toshio Konishi , Yosuke Kojima , Satoru Nemoto , Keishi Tanaka , Jun Sasaki
DOI:
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摘要: A phase-shift mask including a transparent substrate, and light-shielding film formed on the substrate provided with first apertures second which are alternately arranged. The is partially removed through to form recessed portion having predetermined depth. Light transmitted light enabled invert in phase thereof. This characterized that shift of set conformity pitch between an edge aperture film.
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