Method of forming an alternating phase shift circuitry fabrication mask, method of forming a circuitry fabrication mask having a subtractive alternating phase shift region, and alternating phase shift mask

摘要: Disclosed are methods of forming alternating phase shift circuitry fabrication masks, masks having a subtractive region, and masks. In one implementation, method an mask incudes combining pattern data biasing wet undercut etching light transmissive substrate material adjacent regions the in fabricating mask. includes effective to achieve first biased when using fabricate desired circuit on another substrate. The has at least some resolution spacing falling between discrete finite which writing tool used is capable achieving.