MANUFACTURE OF PHASE SHIFT MASK

摘要: PURPOSE:To manufacture a shifter part with high accuracy for phase shift mask in which the is formed by engraving substrate. CONSTITUTION:(a) A Cr light-shielding film 2 patterned on synthetic quartz substrate 1, and (b) area except coated resist pattern 3 such as AZ1350. (c) Then phosphorus ions are implanted whole surface of 1 to 1700Angstrom depth using under 100 200kV accelerating voltage. (d) The put dry etching chamber 5 etch doped layer 6 etchant gas CF4 while irradiated beams ArF laser 4. (e) peeled off obtain 7.