Spacers with Rectangular Profile and Methods of Forming the Same

作者: Yu-Sheng Chang , Tien-I Bao , Chung-Ju Lee

DOI:

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摘要: A method includes forming a spacer layer on top surface and sidewalls of patterned feature, wherein the feature is overlying base layer, protection formed to contact sidewall layer. The horizontal portions are removed, vertical protect remain after removal. etched remove form parts spacers.

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