摘要: Abstract The behavior of a number alpha-substituted vinylsilanes upon electron impact in the mass spectrometer is reported. All such compounds exhibit fragment ions which can be understood by process involving prior loss radical from molecular ion followed bond formation between alpha-substituent and silicon center with remaining portion vinyl moiety. Using alpha-deuterated vinyltrimethylsilane, this was shown to an important one had not been previously considered for systems. MIKE ** data were also obtained on alpha bromovinyltrimethylsilane add support process.
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