A review of diamond synthesis by CVD processes
作者： Michael Schwander , Knut Partes
DOI: 10.1016/J.DIAMOND.2011.08.005
关键词:
摘要: Diamond has some of the most extreme mechanical, physical and chemical properties of all materials. Within the last 50years, a wide variety of manufacturing methods have been developed to deposit diamond layers under various conditions. The most common process for diamond growth is the chemical vapor deposition (CVD). Starting from the first publications until the latest results today, a range of different developments can be seen. Comparing the basic conditions and the process parameters of the CVD techniques, the …
harvard.edu
elsevier.com
sci-hub.se 参考文章(102)
J. Miller, Institution of electrical engineers Railway Law for Engineers: How Legislation, Liability and Legal Issues Affect You, 2006. The Institution of Engineering and Technology Seminar on (Ref. No. 2006/11315). pp. 11- 28 ,(2006)
A. C. Metaxas, Industrial Microwave Heating ,(1988)
Gordon Davies, Inspec, Properties and growth of diamond Institution of Electrical Engineers. ,(1994)
Claire Tendero, Christelle Tixier, Pascal Tristant, Jean Desmaison, Philippe Leprince, Atmospheric pressure plasmas: A review Spectrochimica Acta Part B: Atomic Spectroscopy. ,vol. 61, pp. 2- 30 ,(2006) , 10.1016/J.SAB.2005.10.003
Chengming Li, Limei Wang, Liangxian Chen, Zheng Liu, Lifu Hei, Fanxiu Lu, Free-standing diamond films deposited by DC arc plasma jet on graphite substrates with a destroyable Ti interlayer Diamond and Related Materials. ,vol. 18, pp. 1348- 1352 ,(2009) , 10.1016/J.DIAMOND.2009.08.001
Jan Gäbler, Sven Pleger, Precision and micro CVD diamond-coated grinding tools International Journal of Machine Tools & Manufacture. ,vol. 50, pp. 420- 424 ,(2010) , 10.1016/J.IJMACHTOOLS.2009.10.008
M Werner, R Locher, Growth and application of undoped and doped diamond films Reports on Progress in Physics. ,vol. 61, pp. 1665- 1710 ,(1998) , 10.1088/0034-4885/61/12/002
T. Ižák, M. Marton, M. Varga, M. Vojs, M. Veselý, R. Redhammer, M. Michalka, Bias enhanced nucleation of diamond thin films in a modified HFCVD reactor Vacuum. ,vol. 84, pp. 49- 52 ,(2009) , 10.1016/J.VACUUM.2009.04.065
S. Sciortino, S. Lagomarsino, F. Pieralli, E. Borchi, E. Galvanetto, Polycrystalline diamond synthesis by means of high power pulsed plasma glow discharge CVD Diamond and Related Materials. ,vol. 11, pp. 573- 578 ,(2002) , 10.1016/S0925-9635(01)00630-6
M.L. McConnell, D.P. Dowling, C. Pope, K. Donnelly, A.G. Ryder, G.M. O'Connor, High pressure diamond and diamond-like carbon deposition using a microwave CAP reactor Diamond and Related Materials. ,vol. 11, pp. 1036- 1040 ,(2002) , 10.1016/S0925-9635(01)00637-9