Raman measurements in silica glasses irradiated with energetic ions

作者: R. Saavedra , M. León , P. Martin , D. Jiménez-Rey , R. Vila

DOI: 10.1063/1.4900466

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摘要: Ion irradiation with energetic He+ (2.5 MeV), O4+ (13.5 Si4+ (24.4 MeV) and Cu7+ (32.6 species at several fluences (from 5 × 1012 to 1.65 1015 ion/cm2) were performed in three types of SiO2 glasses different OH content (KU1, KS-4V Infrasil 301). After ion implantation the Raman spectra measured compared unirradiated samples. Irradiated samples fused silica grades exhibit changes broad asymmetric R-band (ω1 around 445 cm−1), D1 (490 cm−1) D2 (605 bands associated small-membered rings. The band shows an increase increasing for ions, indicating structural changes. ion-irradiated neutron irradiated 1017 n/cm2 1018 n/cm2. Macroscopic surface cracking was detected, mainly corresponding deposited energies between 1023 eV/cm3 1024 (after beam shutdown).

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