A Substrate Holder, a Lithographic Apparatus and Method of Manufacturing Devices.
作者： Abraham Alexander Soethoudt , Thomas Poiesz , Martijn Houben
DOI:
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摘要: A substrate holder for use in a lithographic apparatus and configured to support substrate, the comprising: main body having surface; plurality of burls projecting from wherein each burl has distal end engage with substrate; ends substantially conform plane whereby can be supported flat state on burls; frictional force between 10 engaged therewith arises direction parallel event relative movement direction; surfaces are provided release structure so that is less than would arise absence structure.
lens.org 参考文章(23)
Rennie Barber, Mark Mayeda, Wafer cooling chuck with direct coupled peltier unit ,(2003)
Keerthi Gowdaru, Krishnan Shrinivasan, Adaptive heat transfer methods and systems for uniform heat transfer ,(2012)
Chia-Fang Wu, Apparatus for heat treating an object ,(1999)
Richard J. Rzeszut, William D. Lee, Ashwin M. Purohit, Marvin R. LaFontaine, Electrostatic chuck with compliant coat ,(2008)
Jeffrey Tobin, Kevin Joseph Bautista, Sairaju Tallavarjula, Minimal contact edge ring for rapid thermal processing ,(2013)
Raymond Wilhelmus Louis Lafarre, Sjoerd Nicolaas Lambertus Donders, Elisabeth Corinne Rodenburg, Yogesh Pramod Karade, Nicolaas Ten Kate, Nina Vladimirovna Dziomkina, Substrate holder and method of manufacturing a substrate holder ,(2013)
Koji Maeda, Mitsuru Mimata, Fluid temperature adjusting device ,(2012)
Ericka M. Ramirez, William A. Bagley, Stephen C. Wolgast, Pre-heating and load lock pedestal material for high temperature cvd liquid crystal and flat panel display applications ,(2001)
Michael Sogard, Periodic clamping method and apparatus to reduce thermal stress in a wafer ,(2002)
Eric J. Gilbert, Michael W. Miller, Andrew W. Stamford, Jay Weinstein, Jack D. Scott, William J. Greenlee, Substituted piperazines as cb1 antagonists ,(2008)