A new contact conductance measurement technique for metal-HTSC film contact

作者: P.R. Apte , D. Kumar , R. Pinto , M. Sharon , L.C. Gupta

DOI: 10.1109/77.160157

关键词:

摘要: A four-point contact conductance measurement technique has been developed for measuring the of metal-HTSC film interface. distributed RG model predicts a small nonzero (residual) resistance from which is determined. The described along with first results. >

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