Illuminating optical system for use in projecting exposure device
作者： Yasuhiro Kamihara , Hitoshi Ohashi
DOI:
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摘要: An illuminating optical system for use in a projection exposure device with high utilization efficiency of the light from source and capable easily realizing simple construction is disclosed. The comprises source, flux separating condenser leading separated by on reticle, diffraction unit included having linear grating pattern into four.
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