摘要: Abstract Direct current and radio frequency glow discharge plasmas are described in terms of their evolution, mechanism, spatial characteristics, voltage-current relationship. The basic plasma processes such as excitation, ionization/dissociation recombination reviewed using examples the chemically reactive H 2 + O /H N /NH 3 plasmas. This is followed by a discussion some heterogeneous occurring at walls substrates, namely film formation, etching, nitriding analogous reactions.
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